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C7460 参数 Datasheet PDF下载

C7460图片预览
型号: C7460
PDF下载: 下载PDF文件 查看货源
内容描述: 多波段等离子工艺监控 [Multiband Plasma-Process Monitor]
分类和应用: 监控
文件页数/大小: 8 页 / 525 K
品牌: HAMAMATSU [ HAMAMATSU CORPORATION ]
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Multiband Plasma-Process Monitor
Model C7460
The Multiband Plasma-Process Monitor
(MPM) is a system specifically designed for
monitoring the optical plasma emissions that
are created during the various manufacturing
processes of semiconductors including
etching, sputtering, cleaning, and CVD.
The MPM can handle multi-channel recording
in real-time.
q
Simultaneous measurement
from 200 to 950 nm
q
Easy measurement using
optical fiber input
q
High levels of accuracy and
reliability
q
Software for measurement,
analysis and factory integration