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C7460 参数 Datasheet PDF下载

C7460图片预览
型号: C7460
PDF下载: 下载PDF文件 查看货源
内容描述: 多波段等离子工艺监控 [Multiband Plasma-Process Monitor]
分类和应用: 监控
文件页数/大小: 8 页 / 525 K
品牌: HAMAMATSU [ HAMAMATSU CORPORATION ]
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Real-Time Plasma Monitoring
BACKGROUND
Up to 60 percent of the time that a piece of semi-
conductor manufacturing equipment spends in oper-
ation is generally for non productive jobs like plas-
ma cleanup, chamber stabilization (seasoning) and
system diagnosis. Typical approaches for reducing
down-time and repetitive processes like these are to
utilize Advanced Process Control (APC) and Sensor
Based Process Control (SBPC) technologies with
factory LAN services. The MPM allows you to gain
full control over processes using information provi-
ded by the MPM regarding plasma spectra, etching
end-point detection status, plasma fault status, etc.
The MPM opens the possibility of significantly in-
creasing the efficiency of manufacturing equipment.
G
CHIN
A ET
LASM
P
ERING
PUTT
S
CONFIGURATION OF APC WITH MPM (EXAMPLE)
FEATURES
q
Highly Accurate and Reliable
The MPM employs a high-resolution compact spec-
trograph and a highly sensitive detector which diag-
nose plasma with elevated levels of precision.
Along with these superior photometric characteris-
tics, the MPM is compact, sturdy and offers the high
standards of reliability that are required in a manu-
facturing environment.
q
Easy to Operate
The MPM is equipped with a sturdy fiber optic bun-
dle, which can conveniently be combined with the
plasma chamber. Due to this, and due to its easy-to
use software, the MPM is easy to setup and operate.
q
Intelligent Sensor System
The MPM is not just a spectrograph. It also contains in-
ternal data processing capabilities which allow to ex-
tract and compress the relevant infomation from the
data.
q
Easy Fab Integration
The MPM is equipped with several interfaces in-
cluding Ethernet and a TCP/IP protocol stack. To-
gether with its very verstile software framework this
allows the easy integration into existing fab IT infra-
structure.
Ethernet
HUB
Ethernet
Optical fiber
MPM
C7460
1
2
3
4
5
POWER
RS-232C
1
2
Ethernet
C7460
1
2
3
4
5
POWER
RS-232C
1
2
C7460
1
2
3
4
5
POWER
RS-232C
1
2
C7460
1
2
3
4
5
POWER
RS-232C
1
2
Script output (end point, plasma fault status, etc)
STANDARD CONFIGURATION
MPM Standard Configuration
C7460
1
2
3
4
5
POWER
Ethernet (TCP/IP)
RS-232C
1
2
Fiber input optics
Main unit
Computer
U9046 Plasma Process Data Aquisition Software
Windows 98, NT, 2000
2