End-point Synthesis Tool U8851
Optional Software
1The
data recorded by the Multiband Plasma-Process Monitor
C7460 of the changes in the passage of time of the spectrum is
loaded onto the End-point Synthesis Tool U8851.
2With
the analysis function of the U8851, the spectrum data,
which constantly changes, analyzes what kinds of spectrum
patterns are shown by addition, and how each spectrum pattern
is carrying out time changes.
In Fig. 1 the measured data D (l, t) shows that three spectrum
patterns (S
1
[l] to S
3
[l]) are mainly shown with the superposition
of data which carried out time changes like T
1
(t) to T
3
(t),
respectively focusing on the average spectrum.
3The
U8851 can perform end-point detection of a process from
spectrum pattern changes obtained in the analysis of
2
with
changes in the passage of time.
It specifies which spectrum pattern can be utilized for end-point
detection with changes in the passage of time and smoothes and
differentiates waveforms according to changes in the passage of
time to detect an end-point.
Moreover, analysis of
2
and
3
can be simultaneously
performed on two or more wafers, and the detected end-point
time is displayed on a graph.
While verifying an end-point detection with these functions, the
stability of a process can also be evaluated. (Fig.3)
4The
detection operation formula of the acquired end points as
mentioned above, can be saved in a file and downloaded into the
C7460 as well.
In the C7460, end-point detection like in
3
is performed in real
time.
Fig. 3 Example of an analysis display
(a)
(b)
(c)
(a) : An operation formula is set up.
(b) : An operation result is displayed.
(c) : Graph of wafer number pair terminal point time is displayed.
Optical Attenuator C8066
Optional Hardware
OUTLINE
The C8066 is an optical attenuator for the Multiband Plasma-
Process Monitor C7460. It is possible to change the light
intensity in five steps (1, 1/10, 1/100, 1/1000, 1/10000) by the
button on the front panel or via RS-232C interface.
The optimum light intensity for monitoring the plasma
emission can thus be obtained.
7
HAMAMATSU [ HAMAMATSU CORPORATION ]
