Simultaneous Measurement
from 200 nm to 950nm
BENEFITS (EXAMPLES)
q
Easy Plasma Status Settings
Real-time monitoring of the plasma process supports easy to
make settings for the volume of introduced gas and plasma power.
Product yield is increased through improved processing stability,
and the early discovery of abnormalities.
q
Advanced Endpoint Detection
Powerful scripts can be defined as recipes for each endpoint
detection. It is possible to use the information in the whole
spectrum by means of the unique spectral patterns method.
This allows for advanced endpoint control with unprecedented
specificity and precision.
q
Higher Efficiency through Automatic Cleaning Control
Particularly with CVD, in which the chamber must be cleaned
each time a wafer is processed, cleaning time has a major effect
on actual operating efficiency. The automatic control features
greatly improved throughput, increased productivity, and reduced
costs.
q
Monitoring of Impurities and Abnormal Discharges
Monitoring of the emission band, which does not occur in normal
processes, provides warning of impurities and abnormal dis-
charges before they occur, and thus improves yield.
CVD
ASMA
PL
G
ANIN
CLE
APPLICATIONS OVERVIEW
Due to the high versatility of the hardware and the soft-
ware framework, the MPM is suitable for various different
applications, without any compromise in performance or
convenience. These applications can be grouped into the
following categories:
q
Engineering Tasks
Such as process optimization, comparison and matching;
trouble-shooting; etc.
q
Endpoint Control
Advanced, highly specific and sensitive end point control.
q
Fault Detection
Highly selective automatic fault detection.
q
APC Sensor
Automatic extraction of highly specific APC key numbers.
(Under development)
SYSTEM STRUCTURE
Network
v
3-d display of plasma emission of CVD Cleaning (CF O
2
, Ar) of SiN
4
,
Driver Software
control
process data
U9046
Plasma Process
Data Acquisition Software
control
spectrum
data
Plasma equipment
Plasma
Emission
EPD signal
MPM(C7460)
(Hardware)
formula for
end-point detection
Standard
Database
spectrum data
with process data
U8851
End-point Synthesis Tool
Optional
3
HAMAMATSU [ HAMAMATSU CORPORATION ]
